T2.2 Direct Optical Lithography of Functional Inorganic Nanomaterials
Yuanyuan Wang (University of Chicago), Jia-Ahn
Pan (University of Chicago),
Dmitri V. Talapin (University of Chicago)
Photolithograph is an important manufacturing process that relies on using organic or polymer photoresists. Here, we demonstrate a general technique named DOLFIN to prepare photosensitive inks and direct pattern inorganic nanocrystals (NCs) and sol-gel nanomaterials without diluting or contaminating them with photoresists and other byproducts. By purposely designing surface ligands outside NCs with photochemically active X– or Cat+ groups, we design a series of novel NC inks that can be directly patterned not only with DUV, but also with near UV light (i-line, 365 nm), blue light (h-line, 405 nm) and even visible light (450 nm) using environmentally benign and industrially accepted solvents. The generality of DOLFIN approach is demonstrated for a wide range of colloidal NCs including metals, semiconductors, oxides, magnetic or rare earth compounds. Since DOLFIN is a photoresist-free method, no organic impurities are present in the patterned layers, which will help achieve good electronic and optical properties. The ability to directly pattern all-inorganic layers with the resolution and the exposure dosage comparable to that of organic photoresists provides a powerful and versatile nanomanufacturing platform for solution processed thin film device fabrication.
Event Timeslots (1)
SYMPOSIUM T2 – MATERIALS PROCESSING AND CHEMISTRY
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Yuanyuan Wang
Location: Technological Institute M177